Patent · US Active

Semiconductor light emitting device and fabrication method for the semiconductor light emitting device

US8115222B2 · kind B2 · utility

2Cited by
0References
27Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJan 9, 2009
Grant dateFeb 14, 2012
Priority date
Expiry dateMar 9, 2030

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10H20/833

Abstract

A semiconductor light emitting device includes a first metal layer placed on the p-type semiconductor layer on the substrate, and includes a first pattern width W1; a second metal layer on the first metal layer; a transparent electrode layer on the second metal layer and the p type semiconductor layer, and has an opening patterned with a second pattern width W2 on the second metal layer; an insulating film the transparent electrode layer and the second metal layer, and has an opening patterned with third pattern width W3 on the second metal layer; a reflective stacked film on the insulating film, and has an opening patterned with third pattern width W3 on the second metal layer; a third metal layer on the second metal layer of an opening patterned with the reflective stacked film and third pattern width W3; and a fourth metal layer on the third metal layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.