Method and apparatus for in-line processing and immediately sequential or simultaneous processing of flat and flexible substrates through viscous shear in thin cross section gaps for the manufacture of micro-electronic circuits or displays
US8123868B2 · kind B2 · utility
6Cited by
32References
25Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Feb 3, 2010 |
| Grant date | Feb 28, 2012 |
| Priority date | — |
| Expiry date | Feb 3, 2030 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P40/57
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method and apparatus for cleaning, drying, coating, baking etching and deposition of surfaces on glass substrate as it transitions thru and between small gaps between hydro-static porous media bearings. Due to the non-contact nature of the device extremely high pressures can be induced upon the work piece through various fluids without damage to the substrate, allowing the system to utilize the viscous nature of fluids to accomplish the desired cleaning, drying, coating, etching or baking. The process also allows for simultaneous and immediately sequential ordering of processes.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.