Plasma reactor having multiple antenna structure
US8123903B2 · kind B2 · utility
1Cited by
6References
14Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jul 6, 2006 |
| Grant date | Feb 28, 2012 |
| Priority date | — |
| Expiry date | Jun 25, 2029 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/321
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma reactor includes a chamber in which a wafer is treated by a plasma reaction, the chamber being provided at an upper portion with a cylindrical dielectric window, a multiple antenna structure disposed on upper and lower portions of the dielectric window to generate RF magnetic field and apply the RF magnetic field inside the chamber through the dielectric window, thereby generating RF electric field, and an RF electric power supply unit for allowing for a time variation of the magnetic field of the multiple antenna structure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.