Sputtering target and manufacturing method therefor, and recordable optical recording medium
US8124212B2 · kind B2 · utility
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15Claims
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Key dates
| Filing date | Dec 17, 2010 |
| Grant date | Feb 28, 2012 |
| Priority date | — |
| Expiry date | Dec 17, 2030 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/21
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
To provide a sputtering target for preparing a recordable optical recording medium characterized by comprising Bi and B and a manufacturing method thereof, a recordable high density optical recording medium using the sputtering target, and a sputtering target which is capable of improving a speed of the film formation for the improvement of productivity, which has a high intensity at the time of the film formation and which has a heightened packing density.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.