Microporous tectosilicate and method for the production thereof

US8124560B2 · kind B2 · utility

Assignees

• BASF SE
• Rubitec AG · CH

Inventors

• Ulrich Mueller · Hamburg, DE
• Gerald Lippert · Frankfurt (Oder), DE
• James Reuben Brown · Mannheim, DE
• Hermann Gies · Sprockhövel, DE
• Bernd Marler · Bochum, DE
• Nadine Stroeter · Bochum, DE
• Yingxia Wang · Beijing, CN

Key dates

• Filing date: Oct 7, 2010
• Grant date: Feb 28, 2012
• Expiry date: Oct 7, 2030

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C01B39/04
• WIPO field: Materials, metallurgy
• WIPO sector: Chemistry

Abstract

The present invention relates to a tectosilicate having an X-ray diffraction pattern in which at least the following reflections occur:100% relating to the intensity of the maximum peak in the X-ray diffraction pattern.