Plasma generator and work processing apparatus provided with the same
US8128783B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Sep 12, 2007 |
| Grant date | Mar 6, 2012 |
| Priority date | — |
| Expiry date | Oct 5, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32256
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma generator is provided which includes: a microwave generation portion which generates a microwave; a wave guide for propagating the microwave; a plurality of plasma generation nozzles which are attached to the wave guide so as to be apart from each other in the direction where the microwave is propagated, receive the microwave, and generate and emit a plasmatic gas based on the energy of this microwave; and a plurality of stabs which correspond to a part or the whole part of the plasma generation nozzles and are each disposed in the wave guide so as to lie in a rear position a predetermined distance apart from each other in the direction where the microwave is propagated.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.