Process and system for providing acetylene
US8129577B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 4, 2009 |
| Grant date | Mar 6, 2012 |
| Priority date | — |
| Expiry date | Jul 13, 2030 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC07C7/09
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
A system and a process for providing acetylene, preferably at a high purity level (e.g., comprising 100 parts per million (“ppm”), or 10 ppm, or 1 ppm, or 100 parts per billion (“ppb”), or 10 ppb, or 1 ppb or less of solvent), to a point of use, such as a semiconductor manufacturing process, is described herein. In one aspect, there is provided a process for providing a process for providing a high purity acetylene comprising 100 ppm or less solvent to a point of use comprising: providing an acetylene feed stream comprising acetylene and solvent at a temperature ranging from 20° C. to −50° C.; and introducing the acetylene feed stream to a purifier at a temperature ranging from −50° C. to 30° C. to remove at least a portion of the solvent contained therein and provide the high purity acetylene.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.