Patent · US Active

Process and system for providing acetylene

US8129577B2 · kind B2 · utility

1Cited by
5References
5Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 4, 2009
Grant dateMar 6, 2012
Priority date
Expiry dateJul 13, 2030

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC07C7/09
  • WIPO fieldOrganic fine chemistry
  • WIPO sectorChemistry

Abstract

A system and a process for providing acetylene, preferably at a high purity level (e.g., comprising 100 parts per million (“ppm”), or 10 ppm, or 1 ppm, or 100 parts per billion (“ppb”), or 10 ppb, or 1 ppb or less of solvent), to a point of use, such as a semiconductor manufacturing process, is described herein. In one aspect, there is provided a process for providing a process for providing a high purity acetylene comprising 100 ppm or less solvent to a point of use comprising: providing an acetylene feed stream comprising acetylene and solvent at a temperature ranging from 20° C. to −50° C.; and introducing the acetylene feed stream to a purifier at a temperature ranging from −50° C. to 30° C. to remove at least a portion of the solvent contained therein and provide the high purity acetylene.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.