Patent · US Active

Vacuum plasma generator

US8133347B2 · kind B2 · utility

40Cited by

7References

10Claims

0Family size

Assignee

HUETTINGER Elektronik GmbH + Co. KG · DE

Inventors

Michael Glück · Hamburg, DE
Christoph Hofstetter · Teningen, DE
Gerd Hintz · Schallstadt, DE

Key dates

Filing date	Oct 24, 2008
Grant date	Mar 13, 2012
Priority date	—
Expiry date	Jul 24, 2030

Classification

Technology area (CPC H)Electricity
CPC primaryH03H7/40
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

Workpieces in a vacuum chamber are treated by receiving a mains voltage from a voltage supply network; generating at least one intermediate circuit voltage; generating a first RF signal of a basic frequency, and of a first phase position, from the at least one intermediate circuit voltage; generating a second RF signal of the basic frequency, and of a second phase position, from the at least one intermediate circuit voltage; and coupling the first and the second signal and generating an output signal for the vacuum chamber using a 3 dB coupler.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.