Metal optical grayscale mask and manufacturing method thereof
US8133642B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 3, 2010 |
| Grant date | Mar 13, 2012 |
| Priority date | — |
| Expiry date | Dec 3, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/54
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A metal optical grayscale mask includes a layer of metal film which is deposited on transparent substrate, and different transparency pattern which is formed by laser writing on the surface of the metal film. The pattern is continuous, in type of array or random pattern. The grayscale is within 3.0 OD-0.05 OD. The thickness of the metal film is 5-100 nm. A manufacturing method of the metal optical grayscale mask includes that the selected transparent substrate is rinsed by the general semiconductor rinse process, the metal film is deposited on the transparent substrate then different transparency pattern is formed by laser writing on the surface of the metal film. The pattern is continuous, in type of array or the random pattern. The grayscale mask is low in price, antistatic electricity performance is good, the resolution can surpass optical diffraction limit. The manufacturing method is simple. There is a wide band application for micro-optical components and large-scale production of micro-electro-mechanical systems.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.