Method of manufacturing photomask
US8137870B2 · kind B2 · utility
5Cited by
3References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 26, 2009 |
| Grant date | Mar 20, 2012 |
| Priority date | — |
| Expiry date | Jun 14, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG21K2201/061
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of manufacturing a photomask includes: providing a photomask; exposing the photomask to obtain an aerial image of the photomask and evaluating the photomask using the aerial image; and altering an optical parameter of the photomask associated with the aerial image according to the result of evaluation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.