Method of patterning stacked structure
US8138098B2 · kind B2 · utility
11Cited by
3References
5Claims
0Family size
Assignee
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Key dates
| Filing date | Mar 2, 2008 |
| Grant date | Mar 20, 2012 |
| Priority date | — |
| Expiry date | Oct 1, 2029 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31938
Abstract
A stacked structure including a soluble organic semiconductor material and a water soluble photosensitive material is provided. The water soluble photosensitive material is disposed on the surface of the soluble organic semiconductor material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.