Patent · US Active

Liquid metal wetting of micro-fabricated charge-emission structures

US8138665B2 · kind B2 · utility

2Cited by
3References
42Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 9, 2007
Grant dateMar 20, 2012
Priority date
Expiry dateJun 26, 2028

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J2237/31749
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

Described is a micro-fabricated charged particle emission device including a substrate and a plurality of charged particle emission sites formed in the substrate. A path extends between each emission site and a source of liquid metal. Each path is coated with a wetting layer of non-oxidizing metal for wetting the liquid metal. Exemplary non-oxidizing metals that may be used to provide the wetting layer include gold and platinum. The wetting layer is sufficiently thin such that some liquid metal is able to flow to each emission site despite any chemical interaction between the liquid metal and the non-oxidizing metal of the wetting layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.