Optimized projection pattern for long-range depth sensing
US8142023B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Dec 17, 2008 |
| Grant date | Mar 27, 2012 |
| Priority date | — |
| Expiry date | Sep 24, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/20076
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A system and method are disclosed for generating an optimized projection pattern and for using the optimized projection pattern for depth reconstruction. The system includes a De Bruijn graph generation module, a non-recurring De Bruijn sequence generation module and projection pattern generation module. The De Bruijn graph generation module is configured to generate a classical De Bruijn graph. The non-recurring De Bruijn sequence generation module is configured to generate a non-recurring De Bruijn sequence by eliminating nodes with recurring alphabets from the classical De Bruijn sequence and calculating a Hamiltonian cycle of the modified De Bruijn graph. The projection pattern generation module is configured to generate the optimized projection pattern form the non-recurring De Bruijn sequence. The system further comprises a projector to project the non-recurring De Bruijn sequence to a plurality of images and a depth reconstruction module to reconstruct depth images from the plurality of the images.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.