Precursor compositions and methods
US8142847B2 · kind B2 · utility
12Cited by
3References
5Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 3, 2008 |
| Grant date | Mar 27, 2012 |
| Priority date | — |
| Expiry date | Dec 14, 2030 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/405
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Compositions including an amido-group-containing vapor deposition precursor and a stabilizing additive are provided. Such compositions have improved thermal stability and increased volatility as compared to the amido-group-containing vapor deposition precursor itself. These compositions are useful in the deposition of thin films, such as by atomic layer deposition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.