Methods and devices for forming nanostructure monolayers and devices including such monolayers

US8143703B2 · kind B2 · utility

Assignee

• NANOSYS, INC. · US

Inventors

• David Heald · Solvang, US
• Karen Chu Cruden · Pleasanton, US
• Xiangfeng Duan · Los Angeles, US
• Chao Liu · San Jose, US
• J. Wallace Parce · Palo Alto, US

Key dates

• Filing date: Nov 5, 2008
• Grant date: Mar 27, 2012
• Expiry date: Dec 19, 2030

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S977/938
• WIPO field: Semiconductors
• WIPO sector: Electrical engineering

Abstract

Methods for forming or patterning nanostructure arrays are provided. The methods involve formation of arrays on coatings comprising nanostructure association groups, patterning using resist, and/or use of devices that facilitate array formation. Related devices for forming nanostructure arrays are also provided, as are devices including nanostructure arrays (e.g., memory devices).