Wide area stamp for antireflective surface
US8147704B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jul 10, 2009 |
| Grant date | Apr 3, 2012 |
| Priority date | — |
| Expiry date | Apr 7, 2030 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB82Y40/00
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
Nanoimprint molds for molding a surface of a material are provided. A nanoimprint mold includes a body with a molding surface that is formed by shaped nanopillars. The nanopillars may be formed on a substrate and shaped by performing at least a first partial oxidation of the nanopillars and then removing at least a portion of the oxidized material. Once shaped, a hard substance is deposited on the nanopillars to begin forming the molding surface of the nanoimprint mold. The deposition of a hard substance is followed by the deposition of carbon nanotube on the hard substance and then the removal of the substrate and nanopillars from the molding surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.