Substrate with a stack having thermal properties
US8147969B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 27, 2005 |
| Grant date | Apr 3, 2012 |
| Priority date | — |
| Expiry date | Mar 3, 2028 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03C17/366
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
The invention relates to a substrate (1) provided with a thin-film multilayer comprising an alternation of n functional layers (3) having reflection properties in the infrared and/or in solar radiation, and (n+1) coatings (2, 5), where n≧1, said coatings being composed of a layer or a plurality of layers (2a, 2b, 5a, 5b), characterized in that, in order to preserve the optical and/or mechanical quality of the multilayer in the case in which the substrate (1) provided with said multilayer is subjected to a heat treatment of the toughening, bending or annealing type, at least one of the functional layers (3) includes a blocker coating (4) consisting of:
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.