Methods for fabrication of high aspect ratio micropillars and nanopillars
US8148264B2 · kind B2 · utility
4Cited by
5References
14Claims
0Family size
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Key dates
| Filing date | Feb 24, 2010 |
| Grant date | Apr 3, 2012 |
| Priority date | — |
| Expiry date | Aug 19, 2030 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T436/25375
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Methods for fabrication of high aspect ratio micropillars and nanopillars are described. Use of alumina as an etch mask for the fabrication methods is also described. The resulting micropillars and nanopillars are analyzed and a characterization of the etch mask is provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.