Xenon retrieval system and retrieval device
US8153091B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 30, 2007 |
| Grant date | Apr 10, 2012 |
| Priority date | — |
| Expiry date | Jun 14, 2028 |
Classification
- Technology area (CPC F)Mechanical Engineering; Lighting; Heating
- CPC primaryF25J2215/36
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
To provide a simple highly-pure Xe retrieval method and device with high retrieval efficiency by functionally removing such elements as water, CO2 and FCs from waste gases from semiconductor production processes, such as the plasma etching, that contain low-concentration Xe. For samples containing xenon and fluorocarbon, this invention is characterized by having at least first adsorption means (A1) filled with synthetic zeolite with pore size of 4A or smaller and aluminum oxide, arranged serially, gas separation means (A2) composed of silicone or polyethylene hollow fiber gas separation membrane modules 4, second adsorption means (A3) filled with either activated carbon, synthetic zeolite with pore size of 5A or larger, molecular sieving carbon with pore size of 5A or larger, or a combination of these, and reaction means (A4) filled with calcium compounds as reactant.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.