Method for producing highly pure solutions using gaseous hydrogen fluoride
US8153095B2 · kind B2 · utility
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17References
17Claims
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Assignee
Inventors
Key dates
| Filing date | Jun 5, 2003 |
| Grant date | Apr 10, 2012 |
| Priority date | — |
| Expiry date | Nov 29, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/31111
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
Methods for producing highly pure solutions containing hydrogen fluoride, one or more salts thereof or a mixture of two or more thereof, by adding hydrogen fluoride to at least one anhydrous solvent, wherein the hydrogen fluoride is added to the anhydrous solvent or solvents in the form of a gas or as a liquified gas or as a mixture of gas and liquefied gas. High purity hydrogen fluoride and ammonium fluoride solutions produced by the inventive method are also disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.