Dual power source pulse generator for a triggering system
US8154843B2 · kind B2 · utility
2Cited by
4References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 27, 2011 |
| Grant date | Apr 10, 2012 |
| Priority date | — |
| Expiry date | Jun 27, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01T2/02
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An ablative plasma gun having a dual power source pulse generator is configured to generate a high voltage low current pulse and a low voltage high current pulse. A pair of electrodes are disposed and configured to receive the high voltage low current pulse, and to receive the low voltage high current pulse in response to the high voltage low current pulse.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.