Patent · US Active

RF power supply

US8154897B2 · kind B2 · utility

3Cited by

43References

22Claims

0Family size

Assignee

HUETTINGER Elektronik GmbH + Co. KG · DE

Inventors

Michael Glueck · Schreiber, CA
Alex E. Miller · Placentia, US
Erich Pivit · Allmersbach im Tal, DE

Key dates

Filing date	Jul 23, 2008
Grant date	Apr 10, 2012
Priority date	—
Expiry date	Nov 5, 2029

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY02B20/00
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

An RF power supply, in particular a plasma supply device, for generating an output power greater than 500 W at an output frequency of at least 3 MHz includes at least one inverter connectable to a DC power supply, which inverter comprises at least one switching element and an output network. An accompanying line connects an electrical component to the inverter by a lead-in of the output network.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.