Method for fabrication of low-polarization implantable stimulation electrode
US8155754B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 25, 2005 |
| Grant date | Apr 10, 2012 |
| Priority date | — |
| Expiry date | Jun 14, 2026 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49204
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
A method for fabricating an implantable medical electrode includes roughening the electrode substrate, applying an adhesion layer, and depositing a valve metal oxide coating over the adhesion layer under conditions optimized to minimize electrode impedance and post-pulse polarization. The electrode substrate may be a variety of electrode metals or alloys including titanium, platinum, platinum-iridium, or niobium. The adhesion layer may be formed of titanium or zirconium. The valve metal oxide coating is a ruthenium oxide coating sputtered onto the adhesion layer under controlled target power, sputtering pressure, and sputter gas ratio setting optimized to minimize electrode impedance and post-pulse polarization.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.