Method for producing a nanoporous substrate
US8163189B2 · kind B2 · utility
26Cited by
1References
9Claims
0Family size
Assignee
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Key dates
| Filing date | Nov 14, 2006 |
| Grant date | Apr 24, 2012 |
| Priority date | — |
| Expiry date | Aug 15, 2029 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24504
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Nanoporous substrate with fine pores having a diameter from 3 to 40 nm arranged with less than 60 nm periodicity is prepared by a method comprising the steps of coating amphipathic block copolymer on a substrate, forming a film containing hydrophilic cylinders aligned perpendicularly to the surface of the film on a substrate, and immersing the substrate into a solution containing an etchant.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.