Photoacid generator compounds and compositions
US8163461B2 · kind B2 · utility
4Cited by
22References
28Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 9, 2009 |
| Grant date | Apr 24, 2012 |
| Priority date | — |
| Expiry date | Jul 30, 2030 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/122
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention provides various photoacid generator compounds and ionic components thereof. Photoresist compositions that include the ions and non-ionic photoacid generator compounds are also provided. The invention further provides methods of making and using the photoacid generator compounds and photoresist compositions disclosed herein. The compounds and compositions are useful as photoactive components in chemically amplified resist compositions for use in, for example, various microfabrication applications.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.