Method for producing a mould for nanostructured polymer objects
US8168076B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 30, 2009 |
| Grant date | May 1, 2012 |
| Priority date | — |
| Expiry date | Dec 1, 2030 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB29K2907/04
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
A mould for objects made of polymer material is produced by successively depositing a barrier thin layer and a thin layer of diamond-like carbon on at least a part of a metal support. The thin layer of diamond-like carbon is then nanopatterned with a predetermined pattern presenting a form factor of more than 1. Nanopatterning is performed by selective chemical etching in dry phase through a hard mask and etching stops at an interface between the thin layer of diamond-like carbon and the barrier thin layer. The hard mask used was formed beforehand on a free surface of the thin layer of diamond-like carbon by selective chemical etching in dry phase performed through a void lattice delineated by nanoparticles deposited beforehand on a free surface of said hard mask. The barrier thin layer and the nanopatterned thin layer of diamond-like carbon form a bilayer coating presenting a thickness comprised between about 100 nm and about 10 μm.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.