Substrate processing apparatus and attaching/detaching method of reaction vessel
US8172947B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 19, 2007 |
| Grant date | May 8, 2012 |
| Priority date | — |
| Expiry date | Feb 4, 2031 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49826
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
To provide a substrate processing apparatus, comprising: a reaction vessel having a processing chamber inside that processes a substrate; a heating device that heats said substrate from an outer peripheral side of the reaction vessel; a lid member that closes the processing chamber; an attachment/detachment jig placed on the lid member for attaching/detaching the reaction vessel from an inside of the heating device; and a support section provided in an upper side of a lower end of the reaction vessel on an inside wall of the reaction vessel, and abutted on an upper surface of the attachment/detachment jig for attaching/detaching the reaction vessel from the inside of the heating device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.