Method for preparing cerium oxide powder using organic solvent and CMP slurry comprising the same
US8173039B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 20, 2007 |
| Grant date | May 8, 2012 |
| Priority date | — |
| Expiry date | Jul 8, 2028 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/2982
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
Disclosed is a method for directly preparing cerium oxide powder in a solution phase by a) mixing a cerium precursor solution with a precipitant solution to cause a reaction; and b) performing oxidation treatment of the reacted solution, wherein at least one kind of pure organic solvent containing no water is used as a solvent for the cerium precursor solution as well as the precipitant solution to thereby prepare the cerium oxide powder, the particle size of which is adjusted to 50 nm to 3 μm. Cerium oxide powder obtained from the method and CMP slurry comprising the cerium oxide powder as a polishing agent are also disclosed. The method makes it possible to prepare cerium oxide powder with an average particle size of 50 nm or greater and high crystallinity, which is difficult to prepare by the conventional wet precipitation process, by using an organic solvent as a solvent in a wet precipitation process, and the so-prepared cerium oxide powder can be used as a polishing agent for CMP slurry even without being subjected to separate heat treatment.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.