Micropatterning of molecular surfaces via selective irradiation
US8173347B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 11, 2005 |
| Grant date | May 8, 2012 |
| Priority date | — |
| Expiry date | May 23, 2028 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB29L2009/005
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
A method for surface micropatterning includes forming on a surface containing a first polymer a first coating containing a second polymer having first functionalities capable of being converted to second functionalities by exposure to an acid. A second coating containing a photoacid generator is formed on the first coating. The second coating containing the photoacid generator is selectively irradiated in one or more regions thereof with radiation having a spatially varying internsity pattern to generate an acid in each irradiated region of the second coating. The acid converts the first functionalities of each region of the second polymer underlying a respective irradiated region of the second coating to second functionalities. A first molecular patterned surface having one or more regions of the first functionalities and one or more regions of the second functionalities is formed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.