Method for removing moisture from substrate coated with transparent electrode
US8176653B2 · kind B2 · utility
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21Claims
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Key dates
| Filing date | Mar 3, 2009 |
| Grant date | May 15, 2012 |
| Priority date | — |
| Expiry date | Sep 13, 2030 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K30/82
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method for removing moisture from a substrate coated with a transparent electrode comprises the steps of placing the substrate coated with the transparent electrode in an infrared oven, applying heat to the substrate in the infrared oven, drawing the substrate from the infrared oven, loading the substrate in a chamber and reducing pressure in the chamber and performing a heat treatment on the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.