Patent · US Active

Systems and methods for supplying chlorine to and recovering chlorine from a polysilicon plant

US8178059B2 · kind B2 · utility

0Cited by
7References
15Claims
0Family size

Assignee

Inventor

Key dates

Filing dateDec 5, 2008
Grant dateMay 15, 2012
Priority date
Expiry dateJan 13, 2031

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC25B15/08
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A system for supplying chlorine to and recovering chlorine from a polysilicon plant may include a brine treatment system, at least one membrane cell, a chlorine drying system, a chlorine compression system, a hydrogen drying system, a hydrogen compression system, a hydrogen chloride synthesis/desorption system, a hydrogen chloride liquefaction system, a liquefied hydrogen chloride storage system, a hydrogen chloride vaporizer, and a waste conversion and filtration system. These systems may be operatively joined to generate hydrogen chloride gas for delivery to the polysilicon plant. A method for supplying chlorine to the polysilicon plant may include generating hydrogen gas and chlorine gas from recovered and raw salt, converting at least a portion of the hydrogen gas and at least a portion of the chlorine gas to hydrogen chloride, passing the hydrogen chloride through a cryogenic column, vaporizing the hydrogen chloride, and providing the vaporized hydrogen chloride to the polysilicon plant.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.