Patent · US Active

Method for texturing silicon wafers for producing solar cells

US8182706B2 · kind B2 · utility

0Cited by
4References
24Claims
0Family size

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Key dates

Filing dateJul 12, 2007
Grant dateMay 22, 2012
Priority date
Expiry dateSep 7, 2028

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02P70/50

Abstract

In a method for texturing silicon wafers for producing solar cells, the step of introducing a silicon wafer involves the use of a texturing solution which is at a temperature of at least 80 degrees Celsius and which comprises water admixed with 1 percent by weight to 6 percent by weight KOH or 2 percent by weight to 8 percent by weight NaOH and with a surfactant or a surfactant mixture constituting less than 0.01 percent by weight. Very economic texturing can be performed in this way.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.