Patent · US Active

Structuring method

US8182710B2 · kind B2 · utility

0Cited by
3References
10Claims
0Family size

Assignee

Inventor

Key dates

Filing dateNov 17, 2008
Grant dateMay 22, 2012
Priority date
Expiry dateDec 4, 2030

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02E10/50
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A method of structuring multicrystalline silicon surfaces comprises the provision of a texturing solution, the application of the texturing solution to a surface of a semiconductor substrate to be structured and the heating of the texturing solution to a texturing temperature, wherein the texturing solution comprises at least a portion of phosphoric acid.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.