Patent · US Active

Method and device for patterning a disk

US8182982B2 · kind B2 · utility

31Cited by
13References
12Claims
0Family size

Assignee

Inventor

Key dates

Filing dateApr 1, 2009
Grant dateMay 22, 2012
Priority date—
Expiry dateJul 3, 2030

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG11B5/855
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

Embodiments of the invention relate to methods and apparatus useful in the nanopatterning of rotationally symmetric disk materials, like magnetic and optical disks, where a rotatable mask is used to image a radiation-sensitive material. Typically the rotatable mask comprises a cone. The nanopatterning technique makes use of Near-Field photolithography, where the mask used to pattern the disk is in contact or close proximity with the disk. The Near-Field photolithography may make use of an elastomeric phase-shifting mask, or may employ surface plasmon technology, where a rotating cone surface comprises metal nano holes or nanoparticles.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.