Nonvolatile semiconductor memory device including via-holes continuously formed through plural cell array layers
US8183602B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 21, 2008 |
| Grant date | May 22, 2012 |
| Priority date | — |
| Expiry date | Mar 8, 2029 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10N70/8836
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A nonvolatile semiconductor memory device comprises a semiconductor substrate; a cell array block formed on the semiconductor substrate and including plural stacked cell array layers each with a plurality of first lines, a plurality of second lines crossing the plurality of first lines, and memory cells connected at intersections of the first and second lines between both lines; and a plurality of via-holes extending in the stacked direction of the cell array layers to individually connect the first or second line in the each cell array layer to the semiconductor substrate. The via-holes are formed continuously through the plural cell array layers, and multiple via-holes having equal lower end positions and upper end positions are connected to the first or second lines indifferent cell array layers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.