Nozzle-based, vapor-phase, plume delivery structure for use in production of thin-film deposition layer
US8184963B2 · kind B2 · utility
4Cited by
30References
9Claims
0Family size
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Key dates
| Filing date | May 22, 2008 |
| Grant date | May 22, 2012 |
| Priority date | — |
| Expiry date | Sep 8, 2029 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P70/50
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A vapor deposition source including a crucible configured to hold a quantity of molten constituent material and at least one nozzle to pass vapor evaporated from the molten constituent material out of the crucible.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.