Aromatic compounds for suppressing the generation of collagen
US8188277B2 · kind B2 · utility
Assignee
Inventors
- Tae Fukushima
- Shuji Matsumura
- Noriaki Takemura
- Hideaki Satou
- Nobuaki Ito
- Takuya Shitsuta
- Hironori Tsutsui
- Michinori Tanaka
- Keizo Kan
- Hitoshi Nagao
- Kenji Watanabe
- Kuninori Tai
- Takashi Nakagawa
- Hideki Takasu
- Makoto Sakamoto
- Keisuke Miyajima
- Satoshi Yamada
- Yutaka Kojima
- Koichi Yasumura
- Naoto Ohi
- Mitsuhiro Okuno
- Kazuhisa Sugiyama
- Kunihiko Kiyono
- Takashi Suzuki
- Seiji Akamatsu
- Takeshi Kodama
- Yasuo Yanagihara
- Takumi Sumida
Key dates
| Filing date | Aug 3, 2005 |
| Grant date | May 29, 2012 |
| Priority date | — |
| Expiry date | Nov 6, 2027 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC07C2601/18
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
The present invention provides a novel compound, which has an excellent effect of suppressing the generation of collagen and less side effects, with being excellent in terms of safety. The compound of the present invention is represented by the following general formula (1):[wherein X1 represents a nitrogen atom or a group —CH═; R1 represents a group —Z—R6, wherein Z represents a group —CO—, a group —CH(OH)—, or the like, and R6 represents a 5- to 15-membered monocyclic, dicyclic, or tricyclic, saturated or unsaturated heterocyclic group having 1 to 4 nitrogen atoms, oxygen atoms, or sulfur atoms; R2 represents a hydrogen atom, a halogen atom or a lower alkylene group; Y represents a group —O—, a group —CO—, a group —CH(OH)—, a lower alkylene group, or the like; and A represents a groupor the like, wherein R3 represents a hydrogen atom, a lower alkoxy group, or the like, p represents 1 or 2, and R4 represents an imidazolyl lower alkyl group or the like.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.