Creating an XY image pattern on a rotating substrate
US8189902B1 · kind B1 · utility
Assignee
Inventor
Key dates
| Filing date | Dec 22, 2008 |
| Grant date | May 29, 2012 |
| Priority date | — |
| Expiry date | Jun 14, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70366
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Various embodiments of the present invention are generally directed to a method and apparatus for transferring an XY image to a rotating substrate, such as a semiconductor substrate, storage medium, etc. An XY image pattern comprising a plurality of image elements is divided into a matrix of adjacent tiles. A write beam is used to write the XY image pattern to a rotating substrate by defining a radial path at a selected radius of the rotating substrate, identifying the tiles of said matrix that intersect said radial path, and writing a portion of the XY image pattern at the selected radius using image elements from the identified tiles.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.