Patent · US Active

Arrangement for coating a substrate

US8192548B2 · kind B2 · utility

0Cited by

6References

14Claims

0Family size

Assignee

Applied Materials GmbH & Co. KG · DE

Inventors

Uwe Hoffmann · Leverkusen, DE
Manfred Schreil · Dresden, DE
Jose Manuel DIEGUEZ-CAMPO · Hanau, DE
Marcus Bender · Hanau, DE

Key dates

Filing date	Oct 20, 2005
Grant date	Jun 5, 2012
Priority date	—
Expiry date	Jun 8, 2028

Classification

Technology area (CPC F)Mechanical Engineering; Lighting; Heating
CPC primaryF16K1/14
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

The invention relates to an arrangement for the coating of substrates, which comprises an evaporation source and a vapor barrier between the evaporation source and the substrate. The vapor barrier is maintained at a temperature which is at least equal to or above the vaporization temperature of the material to be vaporized. The vapor barrier is implemented as a quartz valve, which includes a spherical closure part connected with a movable rod. In a first position this spherical closure part closes a vapor conducting tube, which is connected with the evaporation source, and, in a second position, the spherical closure part abuts a spherical calotte which seals off a quartz tube.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.