Patent · US Active

Coating apparatus

US8192597B2 · kind B2 · utility

0Cited by

10References

19Claims

0Family size

Assignee

NV BEKAERT SA · BE

Inventors

Erik Dekempeneer · Oostmalle, BE
Wilmert De Bosscher · Drongen, BE
Pascal Verheyen · Zwalm, BE

Key dates

Filing date	Mar 14, 2007
Grant date	Jun 5, 2012
Priority date	—
Expiry date	Aug 19, 2029

Classification

Technology area (CPC H)Electricity
CPC primaryH01J37/3455
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

A coating apparatus (100) for batch coating of substrates is presented. In the batch coater layers of a stack can be deposited by means of physical vapor deposition, by means of chemical vapor deposition or by a mixture of both processes. When compared to previous apparatus, the mixed mode process is particularly stable. This is achieved by using a rotatable magnetron (112) rather than the prior-art planar magnetrons. The apparatus is further equipped with a rotatable shutter that allows for concurrent or alternating process steps.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.