Resin systems for dental restorative materials
US8192673B2 · kind B2 · utility
11Cited by
6References
26Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 31, 2009 |
| Grant date | Jun 5, 2012 |
| Priority date | — |
| Expiry date | Jun 3, 2029 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08G75/045
- WIPO fieldPharmaceuticals
- WIPO sectorChemistry
Abstract
The disclosure provides a new photopolymerizable resin system for dental restorative materials. The resin system utilizes a thiol-ene component as the reactive diluent in dimethacrylate systems. The ternary resin system comprises a thiol monomer, an ene monomer and a dimethacrylate monomer. Use of an off-stoichiometric ratio of thiol:ene functional groups in favor of excess thiols results in enhanced overall functional group conversion, improved polymer mechanical properties, and reduced shrinkage stress of the ternary system when compared to either traditional dimethacrylate or thiol-ene resin systems.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.