Method and device for producing thin silicon rods

US8197595B2 · kind B2 · utility

Assignee

• PV Silicon Forschungs und Produktions GmbH · DE

Inventors

• Helge Riemann · Königs Wusterhausen, DE
• Friedrich-Wilhelm Schulze · Unterschleißheim, DE
• Joerg Fischer · Laboe, DE
• Matthias Renner · Königs Wusterhausen, DE

Key dates

• Filing date: Jan 19, 2010
• Grant date: Jun 12, 2012
• Expiry date: Jan 19, 2030

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10T117/1088
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

A method for producing thin silicon rods using a floating zone crystallization process includes supplying high frequency (HF) current to a flat induction coil having a central opening, a plurality of draw openings and a plate with a slot as a current supply of the HF current so as to provide a circumfluent current to the central opening. An upper end of a raw silicon rod is heated by induction using the flat induction coil so as to form a melt pool. A thin silicon rod is drawn upwards through each of the plurality of draw openings in the flat induction coil from the melt pool without drawing a thin silicon rod through the central opening having the circumfluent current.