Composition for positive type photoresist and positive type photoresist film manufactured thereby
US8197934B2 · kind B2 · utility
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24Claims
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Key dates
| Filing date | Apr 6, 2007 |
| Grant date | Jun 12, 2012 |
| Priority date | — |
| Expiry date | Jan 6, 2029 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/266
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed are a composition for positive type photoresist and a positive type photoresist film manufactured thereby. The composition comprises an alkali soluble resin, a photosensitive compound, a thermo-curable cross linking agent, a sensitivity enhancer and a solvent. The photoresist film has a supporting film and a photoresist layer formed on the supporting film, wherein the photoresist layer comprises the alkali soluble resin, the photosensitive compound, the thermo-curable cross linking agent and the sensitivity enhancer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.