System and method for providing enhanced background rejection in thick tissue with differential-aberration two-photon microscopy
US8198604B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Sep 29, 2008 |
| Grant date | Jun 12, 2012 |
| Priority date | — |
| Expiry date | Dec 14, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B26/06
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A system for providing enhanced background rejection in thick tissue contains an aberrating element for introducing controllable extraneous spatial aberrations in an excitation beam path; at least one mirror capable of directing received laser pulses to the aberrating element; an objective; a beam scanner imaged onto a back aperture of the objective so that the beam scanner steers beam focus within the thick tissue; and a detector for recording signals produced by the tissue. An associated method comprises the steps of acquiring two-photon excited fluorescence of thick tissue without extraneous aberrations; introducing an extraneous aberration pattern in an excitation beam path; acquiring two-photon excited fluorescence of the thick tissue having the introduced extraneous aberration pattern; and subtracting the two-photon excited fluorescence with extraneous aberrations from the acquired standard two-photon excited fluorescence of the thick tissue without extraneous aberrations.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.