Regular pattern arrays for memory and logic on a semiconductor substrate
US8198655B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 27, 2009 |
| Grant date | Jun 12, 2012 |
| Priority date | — |
| Expiry date | Mar 1, 2030 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D84/90
Abstract
An integrated circuit comprising both memory and logic wherein at least one layer of the integrated circuit is fabricated using a common grating pattern for both memory and logic is described. In one embodiment, the integrated circuit comprises a substrate, an active layer, and a gate material layer such as a polysilicon layer, and the active layer, the gate material layer, or both the active layer and the gate material layer are formed using a common grating pattern for both memory and logic. By using a common grating pattern for both memory and logic, a corresponding layer of the integrated circuit can be reliably and affordably manufactured using sub-wavelength lithography.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.