Production method of liquid crystal display including scanning exposure
US8199294B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 1, 2011 |
| Grant date | Jun 12, 2012 |
| Priority date | — |
| Expiry date | Aug 1, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/133757
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
To provide: a production method of a liquid crystal display device, the production method being capable of efficiently and stably providing alignment treatment for an alignment film of the liquid crystal display device, in which a plurality of domains is formed in a pixel region; and an exposure device for alignment treatment. A production method of a liquid crystal display device comprising: a first substrate; a second substrate facing to the first substrate; a liquid crystal layer provided between the substrates; a first alignment film provided on the liquid crystal layer side surface of the first substrate; and a second alignment film provided on the liquid crystal layer side surface of the second substrate, wherein the production method comprises subjecting the first alignment film and/or the second alignment film to scanning exposure continuously over a plurality of pixel regions, and the scanning exposure comprises exposing the first alignment film and/or the second alignment film while scanning an inside of each pixel region more than one time in antiparallel directions to form, in the each pixel region, regions for aligning liquid crystal molecules to the surface (s) of the…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.