Patent · US Active

Method for removing impurities from a metal deposition process solution

US8202431B2 · kind B2 · utility

3Cited by

7References

11Claims

0Family size

Assignee

Enthone GmbH · US

Inventors

Christoph Werner · Mülheim an der Ruhr, DE
Axel Fuhrmann · Neuss, DE
Andreas Möbius · Kaarst, DE

Key dates

Filing date	Nov 27, 2006
Grant date	Jun 19, 2012
Priority date	—
Expiry date	Jul 31, 2028

Classification

Technology area (CPC B)Performing Operations; Transporting
CPC primaryB01J2220/603
WIPO fieldChemical engineering
WIPO sectorChemistry

Abstract

A method and apparatus involving at least two distinct adsorbent media for adsorptive removal of impurities from a metal deposition composition such as an electroless or electrolytic deposition composition.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.