Epitaxial substrate, semiconductor light-emitting device using such epitaxial substrate and fabrication thereof
US8203136B2 · kind B2 · utility
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3Claims
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Key dates
| Filing date | Feb 9, 2011 |
| Grant date | Jun 19, 2012 |
| Priority date | — |
| Expiry date | Feb 9, 2031 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24612
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The invention provides an epitaxial substrate, a semiconductor light-emitting device using such epitaxial substrate and fabrication thereof. The epitaxial substrate according to the invention includes a crystalline substrate. In particular, a crystal surface of the crystalline substrate thereon has a plurality of randomly arranged nanorods. The plurality of nanorods is formed of oxide of a material different from that forms the crystalline substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.