Optical system
US8203702B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 14, 2008 |
| Grant date | Jun 19, 2012 |
| Priority date | — |
| Expiry date | Oct 6, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B13/04
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Method/system locate external articles using source, detector (PSD), entrance aperture, and magnifying/reducing afocal element—expanding FOR>90°, or refining precision. Between (1) source or detector and (2) aperture, at least one plural-axis-rotatable mirror addresses source/detector throughout FOR. ½- to 15-centimeter mirror enables ˜25 to ˜45 μradian beam divergence. Aperture, afocal element, and mirror(s) define source-detector path. Mirror(s) rotate in refractory- (or air/magnetic-) bearing mount; or mirror array. Auxiliary optics illuminate mirror back, monitoring return to measure (null-balance feedback) angle. To optimize imaging, auxiliary radiation propagates via splitters toward array (paralleling measurement paths), then focusing on imaging detector. Focal quality is developed as a PSF, optimized vs. angle; stored results later recover optima. Mirror drive uses magnet(s) on mirror(s). “Piston” motion yields in-phase wavefronts, so array dimensions set diffraction limit. Also: destructive reply; scaling optimizes acceleration vs. thickness; passive systems.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.