Vacuum treatment installation for the production of a disk-shaped workpiece based on a dielectric substrate
US8205572B2 · kind B2 · utility
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4References
7Claims
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Key dates
| Filing date | Sep 23, 2008 |
| Grant date | Jun 26, 2012 |
| Priority date | — |
| Expiry date | Nov 1, 2029 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/5096
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A vacuum treatment installation has a vacuum receptacle with a first planar metallic electrode face, a second dielectric electrode face facing the first planar metallic electrode face which forms a surface of a dielectric areal configuration, a metallic coupling face facing a backside of the areal configuration, electric connections on the coupling and on the first electrode face, a gas line system through the coupling face and an areal distributed pattern of apertures through the areal configuration and wherein the areal dielectric configuration is formed by several ceramic tiles.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.